Mission of the group – to contribute to the research and study activities within the field of applied optics and photonics, emphasizing the research excellence and the quality of academic activities as well attraction of new talents, and the expansion of the R&D infrastructure as well as exploitation of the existing one.
Vision of the group – a growing productive team of researchers carrying out worldwide ambitious research in the field of applied optics and photonics, actively involved in project activities, providing research knowledge-based studies, offering final degree projects and PhD topics reflecting high technology business needs and the latest cutting-edge trends in science.
Main research topics of the group:
- Formation and characterization of micro and nano structures for optical applications
- Modeling of diffractive optical elements and multilayered structures employing numerical simulation methods
- Laser interferometry for characterization of surfaces and mechanical properties of thin films
- Holographic technology for anti-counterfeiting applications
- Characterization of new optical materials and structures: UV / VIS, FTIR, Raman spectroscopy, spectroscopic ellipsometry
- Microscopic examination: optical microscopy, SEM, AFM
- Structural and elemental characterization of materials: XRD, XPS, EDS
- Electrical characterization of materials and structures.
- Nonlinear optical phenomena and ultrashort laser pulse spectroscopy
- Formation of micro- and nano- structures employing ultrashort pulse laser micromachining
- Investigations of plasmonic properties of metal nanoparticles, their ensembles and heterostructures
- Outreach activities promoting scientific phenomena in the field of applied optics and photonics for the general public
The activities of the Research group „Applied Optics and Photonics“ include characterization of light sources and photonic structures as well as their practical applications for laser technologies. The photonic structures applied for anti-counterfeiting applications and in various optical systems are originated employing clean room lithography facilities and vacuum thin film deposition combined with the dry etching technologies. Laser interferometry, holographic lithography, spectroscopic ellipsometry, Raman spectroscopy, FTIR, holography, laser ablation are used for characterization of materials and surfaces as well as for imposing of micro- nano- structures that can be further used for various applications. Ultrafast processes taking place in materials are investigated applying nonlinear optical phenomena and ultrashort laser pulses. The activities also cover microscopic and optical characterization of metal nanoparticles, their ensembles and heterostructures as well as nanocomposite thin films.